Cubic-phase GaN light-emitting diodes
Data(s) |
1999
|
---|---|
Resumo |
The feasibility of growing device-quality cubic GaN/GaAs(001) films by metal organic chemical vapor deposition has been demonstrated. The optical quality of the GaN films was characterized by room-temperature photoluminescence measurements, which shows a full width at half maximum of 46 meV. The structural quality of the films was investigated by transmission electron microscopy. There are submicron-size grains free from threading dislocations and stacking faults. More importantly, a cubic-phase GaN blue light-emitting diode has been fabricated. The device process, which is very simple and compatible with current GaAs technology, indicates a promising future for the blue light-emitting diode. (C) 1999 American Institute of Physics. [S0003-6951(99)01416-3]. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Yang H; Zheng LX; Li JB; Wang XJ; Xu DP; Wang YT; Hu XW; Han PD .Cubic-phase GaN light-emitting diodes ,APPLIED PHYSICS LETTERS,1999,74(17):2498-2500 |
Palavras-Chave | #半导体物理 #MOLECULAR-BEAM EPITAXY #SEMICONDUCTORS #NITRIDE #GROWTH |
Tipo |
期刊论文 |