Influence of crystal perfection on the reverse leakage current of the SiGe Si p-n heterojunction diodes
Data(s) |
1999
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Resumo |
Double-crystal X-ray diffraction and I-V characterization have been carried out on the GSMBE grown SiGe/Si p-n heterojunction materials. Results show that the SiGe alloys crystalline quality and the misfit dislocations are critical influences on the reverse leakage current. The crystal perfection and/or the degree of metastability of the Sice alloys have been estimated in terms of the model proposed by Tsao with the experimental results. High-quality p-n heterojunction diodes can be obtained by optimizing the SiGe alloy structures, which limit the alloys in the metastable states. (C) 1999 Elsevier Science B.V. All rights reserved. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Liu XF; Liu JP; Li JP; Wang YT; Li LY; Sun DZ; Kong MY; Lin LY .Influence of crystal perfection on the reverse leakage current of the SiGe Si p-n heterojunction diodes ,JOURNAL OF CRYSTAL GROWTH ,1999,201(0):551-555 |
Palavras-Chave | #半导体材料 #reverse leakage current #crystalline quality #SiGe Se p-n heterojunction diodes #LAYERS |
Tipo |
期刊论文 |