Improvement of photoluminescence of strained SiGe/Si layers on patterned Si substrate
Data(s) |
1999
|
---|---|
Resumo |
A strained SiGe/Si superlattice structure has been grown on a patterned Si substrate and its photoluminescence has been studied. The patterned substrate is composed of pyramid-like structures. It is found that there are Ge-rich SiGe quantum wires (QWR) at the crossings of adjacent planes that form the pyramid-like structure. Photoluminescence of strained the SiGe layer grown on a planar substrate and a patterned substrate was compared. The total intensity of photoluminescence from the patterned substrate was 5.2 times larger than that from the planar substrates. The result is discussed and it is believed that this increase in photoluminescence is related to the observed QWRs. (C) 1999 Elsevier Science Ltd. All rights reserved. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Si JJ; Guo LW; Yang QQ; Gao JH; Teng D; Zhou JM; Wang QM .Improvement of photoluminescence of strained SiGe/Si layers on patterned Si substrate ,SOLID STATE COMMUNICATIONS ,1999,112(5):255-259 |
Palavras-Chave | #半导体物理 #nanostructures #semiconductors #thin films #luminescence #GROWTH #WELLS #SILICON QUANTUM WIRES |
Tipo |
期刊论文 |