Improvement of photoluminescence of strained SiGe/Si layers on patterned Si substrate


Autoria(s): Si JJ; Guo LW; Yang QQ; Gao JH; Teng D; Zhou JM; Wang QM
Data(s)

1999

Resumo

A strained SiGe/Si superlattice structure has been grown on a patterned Si substrate and its photoluminescence has been studied. The patterned substrate is composed of pyramid-like structures. It is found that there are Ge-rich SiGe quantum wires (QWR) at the crossings of adjacent planes that form the pyramid-like structure. Photoluminescence of strained the SiGe layer grown on a planar substrate and a patterned substrate was compared. The total intensity of photoluminescence from the patterned substrate was 5.2 times larger than that from the planar substrates. The result is discussed and it is believed that this increase in photoluminescence is related to the observed QWRs. (C) 1999 Elsevier Science Ltd. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/12798

http://www.irgrid.ac.cn/handle/1471x/65369

Idioma(s)

英语

Fonte

Si JJ; Guo LW; Yang QQ; Gao JH; Teng D; Zhou JM; Wang QM .Improvement of photoluminescence of strained SiGe/Si layers on patterned Si substrate ,SOLID STATE COMMUNICATIONS ,1999,112(5):255-259

Palavras-Chave #半导体物理 #nanostructures #semiconductors #thin films #luminescence #GROWTH #WELLS #SILICON QUANTUM WIRES
Tipo

期刊论文