Effect of Si overgrowth on the structural and luminescence properties of Ge islands on Si(100)


Autoria(s): Liu JP; Wang JZ; Huang DD; Li JP; Sun DZ; Kong MY
Data(s)

1999

Resumo

The effect of Si overgrowth on the structural and luminescence properties of strained Ge layer grown on Si(1 0 0) is studied. Capping Si leads to the dissolution of Ge island apex and reduced island height. The structural changes in island shape, especially in chemical composition during Si overgrowth have a large effect on the PL properties. The integrated PL intensity of Ge layer increases and there are large blue shifts in peak energies after capping Si. The PL spectra from buried Ge layer are consistent with type-II band alignment in SiGe/Si. We show that the PL properties from buried Ge layer may be tailored by modifying the cap layer growth conditions as well as post-growth annealing. (C) 1999 Elsevier Science B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/12766

http://www.irgrid.ac.cn/handle/1471x/65353

Idioma(s)

英语

Fonte

Liu JP; Wang JZ; Huang DD; Li JP; Sun DZ; Kong MY .Effect of Si overgrowth on the structural and luminescence properties of Ge islands on Si(100) ,JOURNAL OF CRYSTAL GROWTH ,1999,207(1-2):150-153

Palavras-Chave #半导体材料 #QUANTUM-WELLS #PHOTOLUMINESCENCE
Tipo

期刊论文