A comprehensive abatement technology for arsine, phosphorus, sulfur, fluorine, chlorine, oxynitrides and heavy metals in semiconductor industry waste water and gases


Autoria(s): Wen RM
Data(s)

2000

Identificador

http://ir.semi.ac.cn/handle/172111/12592

http://www.irgrid.ac.cn/handle/1471x/65266

Idioma(s)

英语

Fonte

Wen RM .A comprehensive abatement technology for arsine, phosphorus, sulfur, fluorine, chlorine, oxynitrides and heavy metals in semiconductor industry waste water and gases ,CHINESE JOURNAL OF ELECTRONICS,2000,9(1):11-11

Palavras-Chave #半导体器件
Tipo

期刊论文