A study on strong room temperature photoluminescence of a-SiNx : H films


Autoria(s): Wang Y; Yue RF; Li GH; Liao XB; Wang YQ; Diao HW; Kong GL
Data(s)

2000

Resumo

Photoluminescence measurements have been performed in Si-rich a-SiNx:H (x less than or equal to 1.3) alloys prepared by glow discharge. It is observed that the blue shift of the peak of room temperature luminescence spectrum with increasing N content parallels increasing intensity. Two distinct luminescence mechanisms are proposed in a-SiNx:H with the threshold near x = 0.8. For low x, the samples show typical luminescence properties of a-Si:H, while for high x, the normalized luminescence bands are independent of temperature. Combining percolation theory, the luminescence origins are discussed on the basis of Brodsky's quantum well model. (C) 2000 Elsevier Science B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/12576

http://www.irgrid.ac.cn/handle/1471x/65258

Idioma(s)

英语

Fonte

Wang Y; Yue RF; Li GH; Liao XB; Wang YQ; Diao HW; Kong GL .A study on strong room temperature photoluminescence of a-SiNx : H films ,MATERIALS LETTERS,2000,44(2):87-90

Palavras-Chave #半导体材料 #a-SiNx : H alloys #photuluminescence #percolation theory #quantum well model #PECVD #HYDROGENATED AMORPHOUS-SILICON #VISIBLE PHOTOLUMINESCENCE #POROUS SILICON
Tipo

期刊论文