Room temperature 1.55 mu m emission from InAs quantum dots grown on (001)InP substrate by molecular beam epitaxy


Autoria(s): Li YF; Ye XL; Xu B; Liu FQ; Ding D; Jiang WH; Sun ZZ; Zhang YC; Liu HY; Wang ZG
Data(s)

2000

Resumo

Self-assembled InAs nanostructures on (0 0 1)InP substrate have been grown by molecular beam epitaxy (MBE) and evaluated by transmission electron microscopy (TEM) and photoluminescence (PL). It is found that the morphologies of InAs nanostructures depend strongly on the underlying alloy. Through introducing a lattice-matched underlying InAlGaAs layer on InAlAs buffer layer, the InAs quantum dots (QDs) can be much more uniform in size and great improvement in PL properties can be attained at the same time. In particular, 1.55 mu m luminescence at room temperature (RT) can be realized in InAs QDs deposited on (0 0 1)InP substrate with underlying InAlGaAs layer. (C) 2000 Published by Elsevier Science B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/12422

http://www.irgrid.ac.cn/handle/1471x/65181

Idioma(s)

英语

Fonte

Li YF; Ye XL; Xu B; Liu FQ; Ding D; Jiang WH; Sun ZZ; Zhang YC; Liu HY; Wang ZG .Room temperature 1.55 mu m emission from InAs quantum dots grown on (001)InP substrate by molecular beam epitaxy ,JOURNAL OF CRYSTAL GROWTH,2000,218(2-4):451-454

Palavras-Chave #半导体材料 #quantum dots #molecular beam epitaxy #InAs/InP #INP #ISLANDS #GAAS #MATRIX
Tipo

期刊论文