Point defects in III-V compound semiconductors


Autoria(s): Chen N
Data(s)

2000

Resumo

Point defects in III-V compound semiconductors were analyzed systematically in this paper. The effects of substitutes, antisites, interstitials, and vacancies on lattice parameters in III-V compound semiconductors were calculated with a simple model. The formation energies of vacancies in compound semiconductors can be obtained by this calculation. A practical technique established on this model has been utilized for measuring the stoichiometry in GaAs. The relationship between stoichiometry and deep level centers in GaAs was also investigated.

Identificador

http://ir.semi.ac.cn/handle/172111/12404

http://www.irgrid.ac.cn/handle/1471x/65172

Idioma(s)

英语

Fonte

Chen N .Point defects in III-V compound semiconductors ,DEFECTS AND DIFFUSION IN SEMICONDUCTORS,2000,183-1(0 ):85-93

Palavras-Chave #半导体材料 #compound semiconductors #point defects #deep level centres #stoichiometry #MOLECULAR-BEAM EPITAXY #GAAS SINGLE-CRYSTALS #SEMIINSULATING GALLIUM-ARSENIDE #SEMI-INSULATING GAAS #ELECTRICAL-PROPERTIES #LATTICE-PARAMETER #NATIVE DEFECTS #CARBON #DIFFRACTOMETER #STOICHIOMETRY
Tipo

期刊论文