Competition between band gap and yellow luminescence in undoped GaN grown by MOVPE on sapphire substrate


Autoria(s): Xu HZ; Bell A; Wang ZG; Okada Y; Kawabe M; Harrison I; Foxon CT
Data(s)

2001

Resumo

Undoped GaN epilayer on c-face (0 0 0 1) sapphire substrate has been grown by metalorganic vapor-phase epitaxy (MOVPE) in a horizontal-type low-pressure two-channel reactor. Photoluminescence (PL) as a function of temperature and excitation intensity have been systematically studied, and the competition between near band gap ultraviolet (UV) and defect-related yellow luminescence (YL) has been extensively investigated, It is revealed that the ratio of the UV-to-YL peak intensities depends strongly on the excitation intensity and the measurement temperature. The obtained results have been analyzed in comparison with the theoretical predications based on a bimolecular model. (C) 2001 Elsevier Science B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/12318

http://www.irgrid.ac.cn/handle/1471x/65129

Idioma(s)

英语

Fonte

Xu HZ; Bell A; Wang ZG; Okada Y; Kawabe M; Harrison I; Foxon CT .Competition between band gap and yellow luminescence in undoped GaN grown by MOVPE on sapphire substrate ,JOURNAL OF CRYSTAL GROWTH,2001 ,222(1-2):96-103

Palavras-Chave #半导体材料 #gallium nitride #metalorganic vapor-phase epitaxy #photoluminescence #yellow luminescence #N-TYPE GAN #PERSISTENT PHOTOCONDUCTIVITY #THIN-FILMS #DOPED GAN #DEEP LEVELS #ORIGIN #PHOTOLUMINESCENCE #DEPENDENCE #VACANCIES #EPITAXY
Tipo

期刊论文