Longitudinal optic phonon-plasmon coupling in delta-doped metamorphic InAlAs/InGaAs high-electron-mobility transistor structures on GaAs substrates
Data(s) |
2001
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Resumo |
InAlAs/InGaAs metamorphic high-electron-mobility transistor structures with different spacer layers on GaAs substrates are characterized by Raman measurements. The influence of In0.52Al0.48As spacer thickness on longitudinal optic phonon-plasmon coupling is investigated. It is found that the intensity of GaAs-like longitudinal optic phonon, which couples with collective intersubband transitions of two-dimensional electron gas, is strongly affected by the different subband energy spacings, subband electron concentrations, and wave function distributions, which are determined by different spacer thicknesses. (C) 2001 American Institute of Physics. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Jiang CP; Huang ZM; Li ZF; Yu J; Guo SL; Lu W; Chu JH; Cui LJ; Zeng YP; Zhu ZP; Wang BQ .Longitudinal optic phonon-plasmon coupling in delta-doped metamorphic InAlAs/InGaAs high-electron-mobility transistor structures on GaAs substrates ,APPLIED PHYSICS LETTERS,2001 ,79(9):1375-1377 |
Palavras-Chave | #半导体物理 #QUANTUM-WELLS #ACCUMULATION LAYER #RAMAN-SCATTERING #EXCITATIONS #GA1-XINXAS #SPECTRA |
Tipo |
期刊论文 |