Longitudinal optic phonon-plasmon coupling in delta-doped metamorphic InAlAs/InGaAs high-electron-mobility transistor structures on GaAs substrates


Autoria(s): Jiang CP; Huang ZM; Li ZF; Yu J; Guo SL; Lu W; Chu JH; Cui LJ; Zeng YP; Zhu ZP; Wang BQ
Data(s)

2001

Resumo

InAlAs/InGaAs metamorphic high-electron-mobility transistor structures with different spacer layers on GaAs substrates are characterized by Raman measurements. The influence of In0.52Al0.48As spacer thickness on longitudinal optic phonon-plasmon coupling is investigated. It is found that the intensity of GaAs-like longitudinal optic phonon, which couples with collective intersubband transitions of two-dimensional electron gas, is strongly affected by the different subband energy spacings, subband electron concentrations, and wave function distributions, which are determined by different spacer thicknesses. (C) 2001 American Institute of Physics.

Identificador

http://ir.semi.ac.cn/handle/172111/12116

http://www.irgrid.ac.cn/handle/1471x/65028

Idioma(s)

英语

Fonte

Jiang CP; Huang ZM; Li ZF; Yu J; Guo SL; Lu W; Chu JH; Cui LJ; Zeng YP; Zhu ZP; Wang BQ .Longitudinal optic phonon-plasmon coupling in delta-doped metamorphic InAlAs/InGaAs high-electron-mobility transistor structures on GaAs substrates ,APPLIED PHYSICS LETTERS,2001 ,79(9):1375-1377

Palavras-Chave #半导体物理 #QUANTUM-WELLS #ACCUMULATION LAYER #RAMAN-SCATTERING #EXCITATIONS #GA1-XINXAS #SPECTRA
Tipo

期刊论文