Subband electron properties of highly doped InAlAs/InGaAs metamorphic high-electron-mobility transistors on GaAs substrates


Autoria(s): Jiang CP; Huang ZM; Guo SL; Chu JH; Cui LJ; Zeng YP; Zhu ZP; Wang BQ
Data(s)

2001

Resumo

A Shubnikov-de Haas (SdH) oscillation measurement was performed on highly doped InAlAs/InGaAs metamorphic high-electron-mobility transistors on GaAs substrates at a temperature of 1.4 K. By analyzing the experimental data using fast Fourier transform, the electron densities and mobilities of more than one subband are obtained, and an obvious double-peak structure appears at high magnetic field in the Fourier spectrum. In comparing the results of SdH measurements, Hall measurements, and theoretical calculation, we found that this double-peak structure arises from spin splitting of the first-excited subband (i=1). Very close mobilities of 5859 and 5827 cm(2)/V s are deduced from this double-peak structure. The sum of the carrier concentration of all the subbands in the quantum well is only 3.95x10(12) cm(-2) due to incomplete transfer of the electrons from the Si delta -doped layer to the well. (C) 2001 American Institute of Physics.

Identificador

http://ir.semi.ac.cn/handle/172111/12096

http://www.irgrid.ac.cn/handle/1471x/65018

Idioma(s)

英语

Fonte

Jiang CP; Huang ZM; Guo SL; Chu JH; Cui LJ; Zeng YP; Zhu ZP; Wang BQ .Subband electron properties of highly doped InAlAs/InGaAs metamorphic high-electron-mobility transistors on GaAs substrates ,APPLIED PHYSICS LETTERS,2001 ,79(12):1909-1911

Palavras-Chave #半导体物理 #HIGH-PERFORMANCE #HEMTS #HETEROSTRUCTURES
Tipo

期刊论文