The PL "violet shift" of cerium dioxide on silicon


Autoria(s): Chai CL; Yang SY; Liu ZK; Liao MY; Chen NF; Wang ZG
Data(s)

2001

Resumo

CeO2 thin film was fabricated by dual ion beam epitaxial technique. The phenomenon of PL violet shift at room temperature was observed, and the distance of shift was about 65 nm. After the analysis of crystal structure and valence in the compound were carried out by XRD and XPS technique, it was concluded that the PL shift was related with valence of cerium ion in the oxides. When the valence of cerium ion varied front tetravalence to trivalence, the PL peak position would move from blue region to violet region and the phenomenon of "violet shift" was observed.

Identificador

http://ir.semi.ac.cn/handle/172111/12010

http://www.irgrid.ac.cn/handle/1471x/64975

Idioma(s)

英语

Fonte

Chai CL; Yang SY; Liu ZK; Liao MY; Chen NF; Wang ZG .The PL "violet shift" of cerium dioxide on silicon ,CHINESE SCIENCE BULLETIN,2001,46 (24):2046-2048

Palavras-Chave #半导体材料 #cerium dioxide thin film #PL violet shift #THIN-FILMS #DEPOSITION #CEO2 #INTERFACE #OXIDES #GROWTH
Tipo

期刊论文