Polarity determination for GaN thin films by electron energy-loss spectroscopy


Autoria(s): Kong X; Hu GQ; Duan XF; Lu Y; Liu XL
Data(s)

2002

Resumo

The intensity of the N K edge in electron energy-loss spectra from a GaN thin film shows a pronounced difference when the orientation of the film approaches the (0002) and (000-2) Bragg reflections, along the polar direction. This experimental result can be interpreted by the effect associated with interference between the Bloch waves of the incident electron in the GaN crystal. The theoretical calculations indicate that, at the Bragg condition of g=0002 along the Ga-N bond direction, the thickness-averaged electron current density on the N atom plane is much higher than that at g=000 (2) over bar, with a maximum as the specimen thickness is about 0.4xi(0002) (the two-beam extinction distance). The delocalization effect on the experimental spectra is also discussed. (C) 2002 American Institute of Physics.

Identificador

http://ir.semi.ac.cn/handle/172111/11800

http://www.irgrid.ac.cn/handle/1471x/64870

Idioma(s)

英语

Fonte

Kong X; Hu GQ; Duan XF; Lu Y; Liu XL .Polarity determination for GaN thin films by electron energy-loss spectroscopy ,APPLIED PHYSICS LETTERS,2002,81 (11):1990-1992

Palavras-Chave #半导体物理 #DELOCALIZATION CORRECTIONS #ENHANCED MICROANALYSIS #SINGLE-CRYSTALS #DIFFRACTION
Tipo

期刊论文