Structural characterization of epitaxial lateral overgrown GaN on patterned GaN/GaAs(001) substrates


Autoria(s): Shen XM; Fu Y; Feng G; Zhang BS; Feng ZH; Wang YT; Yang H
Data(s)

2002

Resumo

Epitaxial lateral overgrown (ELO) cubic GaN (c-GaN) on SiO2 patterned GaN/GaAs(0 0 1) substrates by metalorganic vapor phase epitaxy was investigated using transmission electron microscopy and X-ray diffraction (XRD) measurements. The density of stacking faults (SFs) in ELO c-GaN was similar to6 x 10(8) cm(-2), while that in underlying GaN template was similar to5 x 10(9) cm(-2). XRD measurements showed that the full-width at half-maximum of c-GaN (0 0 2) rocking curve decreased from 33 to 17.8 arcmin, indicating the improved crystalline quality of ELO c-GaN. The mechanism of SF reduction in ELO c-GaN was also discussed. (C) 2002 Elsevier Science B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/11744

http://www.irgrid.ac.cn/handle/1471x/64842

Idioma(s)

英语

Fonte

Shen XM; Fu Y; Feng G; Zhang BS; Feng ZH; Wang YT; Yang H .Structural characterization of epitaxial lateral overgrown GaN on patterned GaN/GaAs(001) substrates ,JOURNAL OF CRYSTAL GROWTH,2002,246 (1-2):69-72

Palavras-Chave #半导体材料 #transmission electron microscopy #X-ray diffraction #epitaxial lateral overgrowth #metalorganic vapor phase epitaxy #cubic gallium nitride #CHEMICAL-VAPOR-DEPOSITION #CUBIC GAN #PHASE EPITAXY #REDUCTION #GROWTH
Tipo

期刊论文