Thermal annealing behaviour of Ni/Au on n-GaN Schottky contacts


Autoria(s): Sun YP; Shen XM; Wang J; Zhao DG; Feng G; Fu Y; Zhang SM; Zhang ZH; Feng ZH; Bai YX; Yang H
Data(s)

2002

Resumo

The Schottky behaviour of Ni/Au contact on n-GaN was investigated under various annealing conditions by current-voltage (I-V) measurements. A non-linear fitting method was used to extract the contact parameters from the I-V characteristic curves. Experimental results indicate that high quality Schottky contact with a barrier height and ideality factor of 0.86 +/- 0.02 eV and 1.19 +/- 0.02 eV, respectively, can be obtained under 5 min annealing at 600degreesC in N-2 ambience.

Identificador

http://ir.semi.ac.cn/handle/172111/11740

http://www.irgrid.ac.cn/handle/1471x/64840

Idioma(s)

英语

Fonte

Sun YP; Shen XM; Wang J; Zhao DG; Feng G; Fu Y; Zhang SM; Zhang ZH; Feng ZH; Bai YX; Yang H .Thermal annealing behaviour of Ni/Au on n-GaN Schottky contacts ,JOURNAL OF PHYSICS D-APPLIED PHYSICS,2002,35 (20):2648-2651

Palavras-Chave #半导体物理 #RESISTANCE OHMIC CONTACTS #FIELD-EFFECT TRANSISTOR #SINGLE-CRYSTAL GAN #MICROWAVE PERFORMANCE #STABILITY #BARRIER #DIODES
Tipo

期刊论文