Method for measurement of lattice parameter of cubic GaN layers on GaAs (001)


Autoria(s): Zheng XH; Wang YT; Feng ZH; Yang H; Chen H; Zhou JM; Liang JW
Data(s)

2003

Resumo

An extended technique derived from triple-axis diffraction setup was proposed to measure lattice parameters of cubic GaN(c-GaN) films. The fully relaxed lattice parameters of c-GaN are determined to be 4.5036+0.0004 Angstrom, which is closer to the values of a hypothetical perfect crystal. The speculated zero setting correction (Deltatheta) is very slight and within the range of the accuracy of measurement. Additionally, we applied this method to analyze strain of four different kinds of c-GaN samples. It is found that in-plane strain caused by large lattice mismatch and thermal expansion coefficients mismatch directly influence the epilayer growth at high temperatures, indicating that the relaxation of tensile strain after thermal annealing helps to improve the crystalline quality of c-GaN films and optical properties. (C) 2003 Elsevier Science B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/11632

http://www.irgrid.ac.cn/handle/1471x/64786

Idioma(s)

英语

Fonte

Zheng XH; Wang YT; Feng ZH; Yang H; Chen H; Zhou JM; Liang JW .Method for measurement of lattice parameter of cubic GaN layers on GaAs (001) ,JOURNAL OF CRYSTAL GROWTH,2003,250 (3-4):345-348

Palavras-Chave #半导体材料 #in-plane strain #lattice parameters #triple-axis diffraction #c-GaN #GROWTH #FILMS
Tipo

期刊论文