Photoluminesfcence of Er-doped SiO2 films containing Si nanocrystals and Er


Autoria(s): Chen CY; Chen WD; Song SF; Hsu CC
Data(s)

2003

Resumo

Correlations between Si nanocrystal (nc-Si) related photoluminescence (PL), Er3+ emission and nonradiative defects in the Er-doped SiO2 films containing nc-Si (SRSO) are studied. Upon 514.5 nm laser excitation the erbium-doped SRSO samples exhibit PL peaks at around 0.8 and 1.54 mum, which can be assigned to the electron-hole recombination in nc-Si and the intra-4f transition in Er3+, respectively. With increasing Er3+ content in the films, Er3+ emission becomes intense while the PL at 0.8 mum decreases, suggesting a strong coupling of nc-Si and Er 31 ions. Hydrogen plasma treatment for the samples improve the PL intensities of the 0.8 and 1.54 mum bands, indicating H passivation for the nonradiative defects existing in the samples. Further-more, from the effect of hydrogen treatment for the samples, we observe variation of the number of nonradiative defects with annealing temperatures. (C) 2003 Elsevier Science B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/11542

http://www.irgrid.ac.cn/handle/1471x/64741

Idioma(s)

英语

Fonte

Chen CY; Chen WD; Song SF; Hsu CC .Photoluminesfcence of Er-doped SiO2 films containing Si nanocrystals and Er ,JOURNAL OF CRYSTAL GROWTH,2003 ,253 (1-4):10-15

Palavras-Chave #半导体材料 #low dimensional structures #chemical vapor deposition processes #nanomaterials #semiconducting materials #SILICON NANOCRYSTALS #LUMINESCENCE #EXCITATION
Tipo

期刊论文