Structural and optical characterization of Zn1-xCdxO thin films deposited by dc reactive magnetron sputtering


Autoria(s): Ma DW; Ye ZZ; Huang JY; Zhao BH; Wan SK; Sun XH; Wang ZG
Data(s)

2003

Resumo

Zn1-xCdxO crystal thin films with different compositions were prepared on silicon and sapphire substrates by the dc reactive magnetron sputtering technique. X-ray diffraction measurements show that the Zn1-xCdxO films are of completely (002)-preferred orientation for x less than or equal to 0.6. For x = 0.8, the Elm is a mixture of ZnO hexagonal wurtzite crystals and CdO cubic crystals. For pure CdO, it is highly (200) preferential-oriented. Photoluminescence spectrum measurement shows that the Zn1-xCdxO (x = 0.2) thin film has a redshift of 0.14 eV from that of ZnO reported previously.

Identificador

http://ir.semi.ac.cn/handle/172111/11530

http://www.irgrid.ac.cn/handle/1471x/64735

Idioma(s)

英语

Fonte

Ma DW; Ye ZZ; Huang JY; Zhao BH; Wan SK; Sun XH; Wang ZG .Structural and optical characterization of Zn1-xCdxO thin films deposited by dc reactive magnetron sputtering ,CHINESE PHYSICS LETTERS,2003 ,20 (6):942-943

Palavras-Chave #半导体物理 #PHASE EPITAXIAL-GROWTH #PHOTOLUMINESCENT PROPERTIES #SPRAY-PYROLYSIS #ZNO #MGXZN1-XO
Tipo

期刊论文