Formation mechanism of amorphous layer at the interface of Si(111) substrate and AlN buffer layer for GaN


Autoria(s): Hu GQ; Kong X; Wang YQ; Wan L; Duan XF; Lu Y; Liu XL
Data(s)

2003

Identificador

http://ir.semi.ac.cn/handle/172111/11404

http://www.irgrid.ac.cn/handle/1471x/64672

Idioma(s)

英语

Fonte

Hu GQ; Kong X; Wang YQ; Wan L; Duan XF; Lu Y; Liu XL .Formation mechanism of amorphous layer at the interface of Si(111) substrate and AlN buffer layer for GaN ,JOURNAL OF MATERIALS SCIENCE LETTERS,2003,22 (22):1581-1583

Palavras-Chave #半导体材料 #MOLECULAR-BEAM EPITAXY #HIGH-QUALITY GAN #HETEROEPITAXIAL GROWTH #HETEROSTRUCTURES
Tipo

期刊论文