A model for scattering due to interface roughness in finite quantum wells


Autoria(s): Li JM; Wu JJ; Han XX; Lu YW; Lin XL; Zhu QS; Wang ZG
Data(s)

2005

Resumo

A model for scattering due to interface roughness in finite quantum wells (QWs) is developed within the framework of the Boltzmann transport equation and a simple and explicit expression between mobility limited by interface roughness scattering and barrier height is obtained. The main advantage of our model is that it does not involve complicated wavefunction calculations, and thus it is convenient for predicting the mobility in thin finite QWs. It is found that the mobility limited by interface roughness is one order of amplitude higher than the results derived by assuming an infinite barrier, for finite barrier height QWs where x = 0.3. The mobility first decreases and then flattens out as the barrier confinement increases. The experimental results may be explained with monolayers of asperity height 1-2, and a correlation length of about 33 angstrom. The calculation results are in excellent agreement with the experimental data from AlxGa1-xAs/GaAs QWs.

Identificador

http://ir.semi.ac.cn/handle/172111/10910

http://www.irgrid.ac.cn/handle/1471x/64651

Idioma(s)

英语

Fonte

Li JM; Wu JJ; Han XX; Lu YW; Lin XL; Zhu QS; Wang ZG .A model for scattering due to interface roughness in finite quantum wells ,SEMICONDUCTOR SCIENCE AND TECHNOLOGY,2005,20(12):1207-1212

Palavras-Chave #半导体材料 #SINGLE-PARTICLE #ELECTRON-GAS #MOBILITY #GAAS #DISORDER
Tipo

期刊论文