A model for scattering due to interface roughness in finite quantum wells
Data(s) |
2005
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Resumo |
A model for scattering due to interface roughness in finite quantum wells (QWs) is developed within the framework of the Boltzmann transport equation and a simple and explicit expression between mobility limited by interface roughness scattering and barrier height is obtained. The main advantage of our model is that it does not involve complicated wavefunction calculations, and thus it is convenient for predicting the mobility in thin finite QWs. It is found that the mobility limited by interface roughness is one order of amplitude higher than the results derived by assuming an infinite barrier, for finite barrier height QWs where x = 0.3. The mobility first decreases and then flattens out as the barrier confinement increases. The experimental results may be explained with monolayers of asperity height 1-2, and a correlation length of about 33 angstrom. The calculation results are in excellent agreement with the experimental data from AlxGa1-xAs/GaAs QWs. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Li JM; Wu JJ; Han XX; Lu YW; Lin XL; Zhu QS; Wang ZG .A model for scattering due to interface roughness in finite quantum wells ,SEMICONDUCTOR SCIENCE AND TECHNOLOGY,2005,20(12):1207-1212 |
Palavras-Chave | #半导体材料 #SINGLE-PARTICLE #ELECTRON-GAS #MOBILITY #GAAS #DISORDER |
Tipo |
期刊论文 |