Tunneling magnetoresistance in devices based on epitaxial NiMnSb with uniaxial anisotropy


Autoria(s): Liu J; Girgis E; Bach P; Ruster C; Gould C; Schmidt G; Molenkamp LW
Data(s)

2006

Resumo

We demonstrate tunnel magnetoresistance junctions based on a trilayer system consisting of an epitaxial NiMnSb, an aluminum oxide, and a CoFe trilayer. The junctions show a tunneling magnetoresistance of Delta R/R of 8.7% at room temperature which increases to 14.7% at 4.2 K. The layers show a clear separate switching and a small ferromagnetic coupling. A uniaxial in-plane anisotropy in the NiMnSb layer leads to different switching characteristics depending on the direction in which the magnetic field is applied, an effect which can be used for sensor applications. (c) 2006 American Institute of Physics.

Identificador

http://ir.semi.ac.cn/handle/172111/10832

http://www.irgrid.ac.cn/handle/1471x/64612

Idioma(s)

英语

Fonte

Liu J; Girgis E; Bach P; Ruster C; Gould C; Schmidt G; Molenkamp LW .Tunneling magnetoresistance in devices based on epitaxial NiMnSb with uniaxial anisotropy ,JOURNAL OF APPLIED PHYSICS,2006,99(3):Art.No.036110

Palavras-Chave #半导体器件 #METALLIC FERROMAGNET NIMNSB #POSITRON-ANNIHILATION #SPIN-POLARIZATION #FILMS #JUNCTIONS
Tipo

期刊论文