Optical properties of inGaAs/GaAs quantum wells grown by Sb-assisted molecular beam epitaxy


Autoria(s): Jiang DS; Qu YH; Ni HQ; Wu DH; Xu YQ; Niu ZC
Data(s)

2006

Resumo

It is found that both methods using either continuous Sb supply or pre-deposition of a very thin Sb layer are efficient for the Sb-assisted molecular beam epitaxy growth of highly strained InGaAs/GaAs quantum wells (QWs). The emission of QWs is extended to long wavelength close to 1.25 mu m with high luminescence efficiency at room temperature. The influence of rapid thermal annealing (RTA) on the photoluminescence intensity critically depends on the annealing temperature and duration for highly strained QWs. A relatively low RTA temperature of 700 degrees C with a short duration of 10 s is suggested for optimizing the annealing effect. (c) 2005 Elsevier B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/10820

http://www.irgrid.ac.cn/handle/1471x/64606

Idioma(s)

英语

Fonte

Jiang DS; Qu YH; Ni HQ; Wu DH; Xu YQ; Niu ZC .Optical properties of inGaAs/GaAs quantum wells grown by Sb-assisted molecular beam epitaxy ,JOURNAL OF CRYSTAL GROWTH,2006,288(1):40529

Palavras-Chave #半导体物理 #molecular beam epitaxy #quantum wells #semiconducting III-V materials #MU-M #LASERS #TEMPERATURE #SURFACTANT #NM
Tipo

期刊论文