Growth of InAs quantum dots on vicinal GaAs (100) substrates by metalorganic chemical vapor deposition and their optical properties


Autoria(s): Liang S; Zhu HL; Pan JQ; Ye XL; Wang W
Data(s)

2006

Resumo

The growth of InAs quantum dots on vicinal GaAs (100) Substrates was systematically studied using low-pressure metalorganic chemical vapor deposition (MOCVD). The dots showed a clear bimodal size distribution on vicinal substrates. The way of evolution of this bimodal size distribution was studied as a function of growth temperature, InAs layer thickness and InAs deposition rate. The optical properties of dots grown on vicinal substrates were also studied by photoluminescence (PL). It was found that, compared with dots on exact substrates, dots on vicinal substrates had better optical properties such as a narrower PL line width, a longer emission wavelength, and a larger PL intensity. (c) 2006 Elsevier B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/10736

http://www.irgrid.ac.cn/handle/1471x/64564

Idioma(s)

英语

Fonte

Liang S; Zhu HL; Pan JQ; Ye XL; Wang W .Growth of InAs quantum dots on vicinal GaAs (100) substrates by metalorganic chemical vapor deposition and their optical properties ,JOURNAL OF CRYSTAL GROWTH,2006,289(2):477-484

Palavras-Chave #光电子学 #bimodal size distribution #metalorganic vapor phase epitaxy #self-assembled quantum dots #indium arsenide #PHASE-EPITAXY #ISLANDS #INGAAS #SIZE #LASER
Tipo

期刊论文