Growth of high quality semi-insulating InP single crystal by suppression of compensation defects


Autoria(s): Zhao YW; Dong ZY; Duan ML; Sun WR; Yang ZX
Data(s)

2006

Resumo

Deep level defects in as-grown and annealed SI-InP samples were investigated by thermally stimulated current spectroscopy. Correlations between electrical property, compensation ratio, thermal stability and deep defect concentration in SI-InP were revealed. An optimized crystal growth condition for high quality SI-InP was demonstrated based on the experimental results.

Identificador

http://ir.semi.ac.cn/handle/172111/10688

http://www.irgrid.ac.cn/handle/1471x/64540

Idioma(s)

英语

Fonte

Zhao YW; Dong ZY; Duan ML; Sun WR; Yang ZX .Growth of high quality semi-insulating InP single crystal by suppression of compensation defects ,JOURNAL OF RARE EARTHS,2006,24(Sp.Iss.SI ):75-77

Palavras-Chave #半导体材料 #indium phosphide #defect #semi-insualting #STIMULATED CURRENT SPECTROSCOPY #CURRENT TRANSIENT SPECTROSCOPY #SEMI-INSULATING INP #DEEP-LEVEL DEFECTS #FE
Tipo

期刊论文