Temperature dependence of surface quantum dots grown under frequent growth interruption
Data(s) |
2006
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Resumo |
We grow InGaAs quantum dot (QD) at low growth rate with 70 times insertion of growth interruption in MBE system. It is found that because of the extreme growth condition, QDs exhibit a thick wetting layer, large QD height value and special surface morphology which is attributed to the enhanced adatom surface diffusion and In-segregation effect. Temperature dependence of photoluminescence measurement from surface QD shows that this kind of QD has good thermal stability which is explained in terms of the presence of surface oxide. The special distribution of QD may also play a role in this thermal character. (c) 2006 Elsevier B.V. All rights reserved. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Yu LK; Xu B; Wang ZG; Chen YH; Jin P; Zhao C; Sun J; Ding F; Hu LJ .Temperature dependence of surface quantum dots grown under frequent growth interruption ,PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES,2006,33(1):207-210 |
Palavras-Chave | #半导体材料 #growth interruption #in segregation #surface oxide #molecular beam epitaxy #quantum dots #MOLECULAR-BEAM EPITAXY #GAAS #PHOTOLUMINESCENCE #LAYER #SHAPE #SIZE |
Tipo |
期刊论文 |