Temperature dependence of surface quantum dots grown under frequent growth interruption


Autoria(s): Yu LK; Xu B; Wang ZG; Chen YH; Jin P; Zhao C; Sun J; Ding F; Hu LJ
Data(s)

2006

Resumo

We grow InGaAs quantum dot (QD) at low growth rate with 70 times insertion of growth interruption in MBE system. It is found that because of the extreme growth condition, QDs exhibit a thick wetting layer, large QD height value and special surface morphology which is attributed to the enhanced adatom surface diffusion and In-segregation effect. Temperature dependence of photoluminescence measurement from surface QD shows that this kind of QD has good thermal stability which is explained in terms of the presence of surface oxide. The special distribution of QD may also play a role in this thermal character. (c) 2006 Elsevier B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/10580

http://www.irgrid.ac.cn/handle/1471x/64486

Idioma(s)

英语

Fonte

Yu LK; Xu B; Wang ZG; Chen YH; Jin P; Zhao C; Sun J; Ding F; Hu LJ .Temperature dependence of surface quantum dots grown under frequent growth interruption ,PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES,2006,33(1):207-210

Palavras-Chave #半导体材料 #growth interruption #in segregation #surface oxide #molecular beam epitaxy #quantum dots #MOLECULAR-BEAM EPITAXY #GAAS #PHOTOLUMINESCENCE #LAYER #SHAPE #SIZE
Tipo

期刊论文