Optimization of GaInNAs(Sb)/GaAs quantum wells at 1.3-1.55 mu m grown by molecular beam epitaxy


Autoria(s): Ni, HQ (Ni, H. Q.); Niu, ZC (Niu, Z. C.); Fang, ZD (Fang, Z. D.); Huang, SS (Huang, S. S.); Zhang, SY (Zhang, S. Y.); Wu, DH (Wu, D. H.); Shun, Z (Shun, Z.); Han, Q (Han, Q.); Wu, RH (Wu, R. H.)
Data(s)

2007

Resumo

The InGaNAs(Sb)/(GaNAs)/GaAs quantum wells (QWs) emitting at 1.3-1.55 mu m have been grown by molecular beam epitaxy (MBE). The parameters of the radio frequency (RF) such as RF power and flow rate are optimized to reduce the damages from the ions or energetic species. The growth temperature is carefully controlled to prevent the phase segregation and strain relaxation. The effects of Sb on the wavelength and quality are investigated. The GaNAs barrier is used to extend the wavelength and reduce the strain. A 1.5865 mu m InGaNAs(Sb)/GaNAs SQW edge emitting laser lasing at room temperature at continuous wave operation mode is demonstrated. (c) 2006 Elsevier B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/9510

http://www.irgrid.ac.cn/handle/1471x/64167

Idioma(s)

英语

Fonte

Ni, HQ (Ni, H. Q.); Niu, ZC (Niu, Z. C.); Fang, ZD (Fang, Z. D.); Huang, SS (Huang, S. S.); Zhang, SY (Zhang, S. Y.); Wu, DH (Wu, D. H.); Shun, Z (Shun, Z.); Han, Q (Han, Q.); Wu, RH (Wu, R. H.) .Optimization of GaInNAs(Sb)/GaAs quantum wells at 1.3-1.55 mu m grown by molecular beam epitaxy ,JOURNAL OF CRYSTAL GROWTH,APR 2007,301(0):125-128

Palavras-Chave #半导体物理 #quantum wells
Tipo

期刊论文