Temperature dependence of absorption edge in MOCVD grown GaN


Autoria(s): Majid A (Majid Abdul); Ali A (Ali Akbar); Zhu JJ (Zhu Jianjun)
Data(s)

2007

Resumo

We have studied the temperature dependence of absorption edge of GaN thin films grown on sapphire substrate by metal-organic chemical vapor deposition using optical absorption spectroscopy. A shift in absorption edge of about 55 meV has been observed in temperature range 273-343 K. We have proposed a theoretical model to find the energy gap from absorption coefficient using alpha = alpha(max) + (alpha(min) - alpha(max))/[1 + exp 2(E - E-g + KT)/KT]. Temperature dependence of band gap has also been studied by finding an appropriate theoretical fit to our data using E-g(T) = E-g(273 K) - (8.8 x 10(-4)T(2))/(483 + T) + 0.088 (Varshni empirical formula) and E-g(T) = E-g(273 K)-0.231447/[exp(362/T)-1] + 0.082 relations. It has been found that data can be fitted accurately after adding a factor similar to 0.08 in above equations. Debye temperature (483 K) and Einstein temperature (362 K) in the respective equations are found mutually in good agreement.

Identificador

http://ir.semi.ac.cn/handle/172111/9286

http://www.irgrid.ac.cn/handle/1471x/64055

Idioma(s)

英语

Fonte

Majid A (Majid Abdul); Ali A (Ali Akbar); Zhu JJ (Zhu Jianjun) .Temperature dependence of absorption edge in MOCVD grown GaN ,JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,DEC 2007,18 (12):1229-1233

Palavras-Chave #光电子学 #CHEMICAL-VAPOR-DEPOSITION
Tipo

期刊论文