Temperature dependence of absorption edge in MOCVD grown GaN
Data(s) |
2007
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Resumo |
We have studied the temperature dependence of absorption edge of GaN thin films grown on sapphire substrate by metal-organic chemical vapor deposition using optical absorption spectroscopy. A shift in absorption edge of about 55 meV has been observed in temperature range 273-343 K. We have proposed a theoretical model to find the energy gap from absorption coefficient using alpha = alpha(max) + (alpha(min) - alpha(max))/[1 + exp 2(E - E-g + KT)/KT]. Temperature dependence of band gap has also been studied by finding an appropriate theoretical fit to our data using E-g(T) = E-g(273 K) - (8.8 x 10(-4)T(2))/(483 + T) + 0.088 (Varshni empirical formula) and E-g(T) = E-g(273 K)-0.231447/[exp(362/T)-1] + 0.082 relations. It has been found that data can be fitted accurately after adding a factor similar to 0.08 in above equations. Debye temperature (483 K) and Einstein temperature (362 K) in the respective equations are found mutually in good agreement. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Majid A (Majid Abdul); Ali A (Ali Akbar); Zhu JJ (Zhu Jianjun) .Temperature dependence of absorption edge in MOCVD grown GaN ,JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,DEC 2007,18 (12):1229-1233 |
Palavras-Chave | #光电子学 #CHEMICAL-VAPOR-DEPOSITION |
Tipo |
期刊论文 |