Design, fabrication, and characterization of an ultracompact low-loss photonic crystal corner mirror


Autoria(s): Yu HJ (Yu Hejun); Yu JZ (Yu Jinzhong); Yu Y (Yu Yude); Fan ZC (Fan Zhong-Chao); Chen SW (Chen Shaowu)
Data(s)

2007

Resumo

An ultracompact, low-loss, and broad-band corner mirror, based on photonic crystals, is investigated in this paper. Based on the theoretical analysis of the loss mechanism, the boundary layers of the photonic crystal region are revised to improve the extra losses, and the transmission characteristics are evaluated by using the 3-D finite-difference time-domain method. The device with optimized structure was fabricated on silicon-on-insulator substrate by using electron-beam lithography and inductively coupled plasma etching. The measured extra losses are about 1.1 +/- 0.4 dB per corner mirror for transverse-electronic polarization for the scanning wavelength range of 1510-1630 nm. Dimensions of the achieved PC corner mirror are less than ;7 x 7 mu m(2), which are only about one tenth of conventional wave-guide corner mirrors.

Identificador

http://ir.semi.ac.cn/handle/172111/9240

http://www.irgrid.ac.cn/handle/1471x/64032

Idioma(s)

英语

Fonte

Yu, HJ (Yu, Hejun); Yu, JZ (Yu, Jinzhong); Yu, Y (Yu, Yude); Fan, ZC (Fan, Zhong-Chao); Chen, SW (Chen, Shaowu) .Design, fabrication, and characterization of an ultracompact low-loss photonic crystal corner mirror ,IEEE JOURNAL OF QUANTUM ELECTRONICS,SEP-OCT 2007,43 (9-10):876-883

Palavras-Chave #半导体材料 #corner mirror
Tipo

期刊论文