Field emission mechanism from a single-layer ultra-thin semiconductor film cathode


Autoria(s): Duan ZQ (Duan, Zhi-Qiang); Wang RZ (Wang, Ru-Zhi); Yuan RY (Yuan, Rui-Yang); Yang W (Yang, Wei); Wang B (Wang, Bo); Yan H (Yan, Hui)
Data(s)

2007

Resumo

Field emission (FE) from a single-layer ultra-thin semiconductor film cathode (SUSC) on a metal substrate has been investigated theoretically. The self-consistent quantum FE model is developed by synthetically considering the energy band bending and electron scattering. As a typical example, we calculate the FE properties of ultra-thin A1N film with an adjustable film thickness from 1 to 10 nm. The calculated results show that the FE characteristic is evidently modulated by varying the film thickness, and there is an optimum thickness of about 3 nm. Furthermore, a four-step FE mechanism is suggested such that the distinct FE current of a SUSC is rooted in the thickness sensitivity of its quantum structure, and the optimum FE properties of the SUSC should be attributed to the change in the effective potential combined with the attenuation of electron scattering.

Identificador

http://ir.semi.ac.cn/handle/172111/9206

http://www.irgrid.ac.cn/handle/1471x/64015

Idioma(s)

英语

Fonte

Duan, ZQ (Duan, Zhi-Qiang); Wang, RZ (Wang, Ru-Zhi); Yuan, RY (Yuan, Rui-Yang); Yang, W (Yang, Wei); Wang, B (Wang, Bo); Yan, H (Yan, Hui) .Field emission mechanism from a single-layer ultra-thin semiconductor film cathode ,JOURNAL OF PHYSICS D-APPLIED PHYSICS,OCT 7 2007,40 (19):5828-5832

Palavras-Chave #半导体材料 #AMORPHOUS-CARBON FILMS
Tipo

期刊论文