Influence of dislocations on photoluminescence of InGaN/GaN multiple quantum wells


Autoria(s): Zhang JC; Jiang DS; Sun Q; Wang JF; Wang YT; Liu JP; Chen J; Jin RQ; Zhu JJ; Yang H; Dai T; Jia QJ
Data(s)

2005

Resumo

The influence of dislocations on photoluminescence (PL) of InGaN/GaN multiple quantum wells (MQWs) is investigated by triple-axis x-ray diffraction (TAXRD), transmission electron microscopy (TEM), and PL spectra. The omega scan of every satellite peak by TAXRD is adopted to evaluate the mean screw and edge dislocation densities in MQWs. The results show that dislocations can lead to a reduction of the PL-integrated intensity of InGaN/GaN MQWs under certain conditions, with edge dislocations playing a decisive role. Additionally, the dislocations can broaden the PL peak, but the effect becomes evident only under the condition when the interface roughness is relatively low. (C) 2005 American Institute of Physics.

Identificador

http://ir.semi.ac.cn/handle/172111/8532

http://www.irgrid.ac.cn/handle/1471x/63796

Idioma(s)

英语

Fonte

Zhang, JC; Jiang, DS; Sun, Q; Wang, JF; Wang, YT; Liu, JP; Chen, J; Jin, RQ; Zhu, JJ; Yang, H; Dai, T; Jia, QJ .Influence of dislocations on photoluminescence of InGaN/GaN multiple quantum wells ,APPLIED PHYSICS LETTERS,AUG 15 2005,87 (7):Art.No.071908

Palavras-Chave #光电子学 #X-RAY-DIFFRACTION
Tipo

期刊论文