Influence of dislocations on photoluminescence of InGaN/GaN multiple quantum wells
Data(s) |
2005
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Resumo |
The influence of dislocations on photoluminescence (PL) of InGaN/GaN multiple quantum wells (MQWs) is investigated by triple-axis x-ray diffraction (TAXRD), transmission electron microscopy (TEM), and PL spectra. The omega scan of every satellite peak by TAXRD is adopted to evaluate the mean screw and edge dislocation densities in MQWs. The results show that dislocations can lead to a reduction of the PL-integrated intensity of InGaN/GaN MQWs under certain conditions, with edge dislocations playing a decisive role. Additionally, the dislocations can broaden the PL peak, but the effect becomes evident only under the condition when the interface roughness is relatively low. (C) 2005 American Institute of Physics. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Zhang, JC; Jiang, DS; Sun, Q; Wang, JF; Wang, YT; Liu, JP; Chen, J; Jin, RQ; Zhu, JJ; Yang, H; Dai, T; Jia, QJ .Influence of dislocations on photoluminescence of InGaN/GaN multiple quantum wells ,APPLIED PHYSICS LETTERS,AUG 15 2005,87 (7):Art.No.071908 |
Palavras-Chave | #光电子学 #X-RAY-DIFFRACTION |
Tipo |
期刊论文 |