Photoluminescence of Er-doped hydrogenated amorphous silicon nitride


Autoria(s): Zhao, Q; Yan, H; Kumeda, A; Shimizu, T
Data(s)

2004

Resumo

Er photoluminescence (Er PL) and dangling bonds (DBs) of annealed Er-doped hydrogenated amorphous silicon nitride (a-SiN:H(Er)) with various concentrations of nitrogen are studied in the temperature range 62-300 K. Post-annealing process is employed to change the DBs density of a-SiN:H(Er). PL spectra, DBs density and H, N concentrations are measured. The intensity of Er PL displays complicated relation with Si DBs density within the annealing temperature range 200-500 degreesC. The intensity of Er PL first increases with decreasing density of Si dangling bonds owing to the structural relaxation up to 250 degreesC, and continues to increase up to 350 degreesC even though the density of Si DBs increases due to the improvement of symmetry environment of Er3+. (C) 2003 Elsevier B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/8114

http://www.irgrid.ac.cn/handle/1471x/63651

Idioma(s)

英语

Fonte

Zhao, Q; Yan, H; Kumeda, A; Shimizu, T .Photoluminescence of Er-doped hydrogenated amorphous silicon nitride ,APPLIED SURFACE SCIENCE,APR 15 2004,227 (1-4):306-311

Palavras-Chave #半导体材料 #Er-doped
Tipo

期刊论文