Fabrication of low-cost and high-reflectivity bottom mirrors for Si-based micro-cavity devices


Autoria(s): Li CB; Li HX; Mao RW; Zuo YH; Shi WH; Zhao L; Luo LP; Cheng BW; Yu JZ; Wang QM
Data(s)

2004

Resumo

A novel and simple way to prepare high-reflectivity bottom mirrors for Si-based micro-cavity devices is reported. The bottom mirror was deposited in the hole, which was etched from the backside of the sample by ethylenediamine-pyrocatechol-water solution with the buried Sio, layer in the silicon-on-insulator substrate as the etching-stop layer. The high-reflectivity of the bottom mirror deposited in the hole and the narrow hill width at half maximum of the cavity formed by this method both indicate the successful preparation of the bottom mirror for Si-based micro-cavity devices.

Identificador

http://ir.semi.ac.cn/handle/172111/7978

http://www.irgrid.ac.cn/handle/1471x/63583

Idioma(s)

英语

Fonte

Li, CB; Li, HX; Mao, RW; Zuo, YH; Shi, WH; Zhao, L; Luo, LP; Cheng, BW; Yu, JZ; Wang, QM .Fabrication of low-cost and high-reflectivity bottom mirrors for Si-based micro-cavity devices ,ELECTRONICS LETTERS,AUG 19 2004,40 (17):1079-1080

Palavras-Chave #光电子学 #BRAGG REFLECTORS
Tipo

期刊论文