Dislocation scattering in a two-dimensional electron gas of an AlxGa1-xN/GaN heterostructure
Data(s) |
2004
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Resumo |
The theoretical electron mobility limited by dislocation scattering of a two-dimensional electron gas confined near the interface of an AlxGa1-xN/GaN heterostructure is calculated. The accurate wave functions and electron distributions of the three lowest subbands for a typical structure are obtained by solving the Schrodinger and Poisson equations self-consistently. Based on the model of treating dislocation as a charged line, a simple scattering potential, a square-well potential, is utilized. The estimated mobility suggests that such a choice can simplify the calculation without introducing significant deviation from experimental data. It is also found that the dislocation scattering dominates both the low- and moderate-temperature mobilities and accounts for the nearly flattening-out behavior with increasing temperature. To clarify the role of dislocation scattering all standard scattering mechanisms are included in the calculation. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Han, XX; Li, DB; Yuan, HR; Sun, XH; Liu, XL; Wang, XH; Zhu, QS; Wang, ZG .Dislocation scattering in a two-dimensional electron gas of an AlxGa1-xN/GaN heterostructure ,PHYSICA STATUS SOLIDI B-BASIC RESEARCH,NOV 2004,241 (13):3000-3008 |
Palavras-Chave | #半导体材料 #FIELD-EFFECT TRANSISTORS |
Tipo |
期刊论文 |