Dislocation scattering in a two-dimensional electron gas of an AlxGa1-xN/GaN heterostructure


Autoria(s): Han XX; Li DB; Yuan HR; Sun XH; Liu XL; Wang XH; Zhu QS; Wang ZG
Data(s)

2004

Resumo

The theoretical electron mobility limited by dislocation scattering of a two-dimensional electron gas confined near the interface of an AlxGa1-xN/GaN heterostructure is calculated. The accurate wave functions and electron distributions of the three lowest subbands for a typical structure are obtained by solving the Schrodinger and Poisson equations self-consistently. Based on the model of treating dislocation as a charged line, a simple scattering potential, a square-well potential, is utilized. The estimated mobility suggests that such a choice can simplify the calculation without introducing significant deviation from experimental data. It is also found that the dislocation scattering dominates both the low- and moderate-temperature mobilities and accounts for the nearly flattening-out behavior with increasing temperature. To clarify the role of dislocation scattering all standard scattering mechanisms are included in the calculation.

Identificador

http://ir.semi.ac.cn/handle/172111/7912

http://www.irgrid.ac.cn/handle/1471x/63550

Idioma(s)

英语

Fonte

Han, XX; Li, DB; Yuan, HR; Sun, XH; Liu, XL; Wang, XH; Zhu, QS; Wang, ZG .Dislocation scattering in a two-dimensional electron gas of an AlxGa1-xN/GaN heterostructure ,PHYSICA STATUS SOLIDI B-BASIC RESEARCH,NOV 2004,241 (13):3000-3008

Palavras-Chave #半导体材料 #FIELD-EFFECT TRANSISTORS
Tipo

期刊论文