Effect of Nitridation on Morphology, Structural Properties and Stress of AIN Films


Autoria(s): Hu WG; Jiao CM; Wei HY; Zhang PF; Kang TT; Zhang RQ; Liu XL
Data(s)

2008

Resumo

We investigate effects of nitridation on AIN morphology, structural properties and stress. It is found that 3 min nitridation can prominently improve AIN crystal structure, and slightly smooth the surface morphology. However, 10 min nitridation degrades out-of-plane crystal structure and surface morphology instead. Additionally, 3-min nitridation introduces more tensile stress (1.5 GPa) in AIN films, which can be attributed to the weaker islands 2D coalescent. Nitridation for 10 min can introduce more defects, or even forms polycrystallinity interlayer, which relaxes the stress. Thus, the stress in AIN with 10 min nitridation decreases to -0.2 GPa compressive stress.

National Natural Science Foundation of China 60376013 Supported by the National Natural Science Foundation of China under Grant No 60376013.

Identificador

http://ir.semi.ac.cn/handle/172111/7477

http://www.irgrid.ac.cn/handle/1471x/63476

Idioma(s)

英语

Fonte

Hu WG ; Jiao CM ; Wei HY ; Zhang PF ; Kang TT ; Zhang RQ ; Liu XL .Effect of Nitridation on Morphology, Structural Properties and Stress of AIN Films ,CHINESE PHYSICS LETTERS,2008 ,25(12):4364-4367

Palavras-Chave #半导体材料 #TRANSMISSION ELECTRON-MICROSCOPY #WURTZITE-TYPE CRYSTALS #VAPOR-PHASE EPITAXY #INTRINSIC STRESS #SAPPHIRE SURFACE #THIN-FILMS #GAN #GROWTH #DIFFRACTION #MECHANISM
Tipo

期刊论文