Desorption and Ripening of Low Density InAs Quantum Dots


Autoria(s): Zhan F; Huang SS; Niu ZC; Ni HQ; Xiong YH; Fang ZD; Zhou HY; Luo Y
Data(s)

2009

Resumo

In this paper, combining low deposition rate with proper growth temperature, we have developed a way to prepare very low-density quantum dots (QDs) suited for the study of single OD properties without resorting to submicron lithography. Experiment results demonstrate that InAs desorption is significant during growing the low density QDs. Ripening of InAs QDs is clearly observed during the post-growth annealing. Photoluminescence spectroscopy reveals that the emission wavelength of low density InAs QDs arrives at 1332.4 nm with a GaAs capping layer.

Identificador

http://ir.semi.ac.cn/handle/172111/7325

http://www.irgrid.ac.cn/handle/1471x/63400

Idioma(s)

英语

Fonte

Zhan F ; Huang SS ; Niu ZC ; Ni HQ ; Xiong YH ; Fang ZD ; Zhou HY ; Luo Y .Desorption and Ripening of Low Density InAs Quantum Dots ,JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY,2009 ,9(2):844-847

Palavras-Chave #半导体化学 #Quantum Dots #Desorption #Molecular Beam Epitaxy
Tipo

期刊论文