Room temperature photoluminescence of tensile-strained Ge/Si0.13Ge0.87 quantum wells grown on silicon-based germanium virtual substrate


Autoria(s): Chen YH; Li C; Zhou ZW; Lai HK; Chen SY; Ding WC; Cheng BW; Yu YD
Data(s)

2009

Resumo

We report a room temperature study of the direct band gap photoluminescence of tensile-strained Ge/Si0.13Ge0.87 multiple quantum wells grown on Si-based germanium virtual substrates by ultrahigh vacuum chemical vapor deposition. Blueshifts of the luminescence peak energy from the Ge quantum wells in comparison with the Ge virtual substrate are in good agreement with the theoretical prediction when we attribute the luminescence from the quantum well to the c Gamma 1-HH1 direct band transition. The reduction in direct band gap in the tensile strained Ge epilayer and the quantum confinement effect in the Ge/Si0.13Ge0.87 quantum wells are directly demonstrated by room temperature photoluminescence.

National Basic Research Program of China 2007CB613404 National Natural Science Foundation of China 60676027 50672079Key Projects of Fujian Science and Technology 2006H0036 Program for New Century Excellent Talents in University This work was supported by the National Basic Research Program of China (973 Program) under Grant No. 2007CB613404, the National Natural Science Foundation of China under Grant Nos. 60676027 and 50672079, the Key Projects of Fujian Science and Technology (Contact No. 2006H0036), and Program for New Century Excellent Talents in University.

Identificador

http://ir.semi.ac.cn/handle/172111/7249

http://www.irgrid.ac.cn/handle/1471x/63362

Idioma(s)

英语

Fonte

Chen YH ; Li C ; Zhou ZW ; Lai HK ; Chen SY ; Ding WC ; Cheng BW ; Yu YD .Room temperature photoluminescence of tensile-strained Ge/Si0.13Ge0.87 quantum wells grown on silicon-based germanium virtual substrate ,APPLIED PHYSICS LETTERS,2009 ,94(14):Art. No. 141902

Palavras-Chave #半导体物理 #chemical vapour deposition #elemental semiconductors #energy gap #germanium #Ge-Si alloys #photoluminescence #semiconductor epitaxial layers #semiconductor quantum wells #silicon #tensile strength
Tipo

期刊论文