Growth and characterization of GaInNAs by molecular beam epitaxy using a nitrogen irradiation method
Data(s) |
2009
|
---|---|
Resumo |
We propose an innovative technique, making use of the In segregation effect, referred as the N irradiation method, to enhance In-N bonding and extend the emission wavelength of GaInNAs quantum wells (QWs). After the formation of a complete In floating layer, the growth is interrupted and N irradiation is initiated. The majority of N atoms are forced to bond with In atoms and their incorporation is regulated independently by the N exposure time and the As pressure. The effect of the N exposure time and As pressure on the N incorporation and the optical quality of GaInNAs QWs were investigated. Anomalous photoluminescence (PL) wavelength red shifts after rapid thermal annealing (RTA) were observed in the N-irradiated samples, whereas a normal GaInNAs sample revealed a blue shift. This method provides an alternative way to extend the emission wavelength of GaInNAs QWs with decent optical quality. We demonstrate light emission at 1546 nm from an 11-nm-thick QW, using this method and the PL intensity is similar to that of a 7-nm-thick GaInNAs QW grown at a reduced rate. (C) 2008 Elsevier B.V. All rights reserved. Swedish Foundation for Strategic Research (SSF) Swedish Agency for International Development Cooperation (SIDA) This work was supported by the Swedish Foundation for Strategic Research (SSF) and the Swedish Agency for International Development Cooperation (SIDA). |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Zhao H ; Wang SM ; Zhao QX ; Sadeghi M ; Larsson A .Growth and characterization of GaInNAs by molecular beam epitaxy using a nitrogen irradiation method ,JOURNAL OF CRYSTAL GROWTH,2009 ,311(7):1723-1727 |
Palavras-Chave | #半导体材料 #Quantum well #Dilute nitride #Rapid thermal annealing #InGaAs #GaInNAs |
Tipo |
期刊论文 |