Well-width dependence of in-plane optical anisotropy in (001) GaAs/AlGaAs quantum wells induced by in-plane uniaxial strain and interface asymmetry


Autoria(s): Tang CG; Chen YH; Xu B; Ye XL; Wang ZG
Data(s)

2009

Resumo

The well-width dependence of in-plane optical anisotropy (IPOA) in (001) GaAs/AlxGa1-xAs quantum wells induced by in-plane uniaxial strain and interface asymmetry has been studied comprehensively. Theoretical calculations show that the IPOA induced by in-plane uniaxial strain and interface asymmetry exhibits much different well-width dependence. The strain-induced IPOA is inversely proportional to the energy spacing between heavy- and light-hole subbands, so it increases with the well width. However, the interface-related IPOA is mainly determined by the probability that the heavy- and light-holes appear at the interfaces, so it decreases with the well width. Reflectance difference spectroscopy has been carried out to measure the IPOA of (001) GaAs/AlxGa1-xAs quantum wells with different well widths. Strain- and interface-induced IPOA have been distinguished by using a stress apparatus, and good agreement with the theoretical prediction is obtained. The anisotropic interface potential parameters are also determined. In addition, the energy shift between the interface- and strain-induced 1H1E reflectance difference (RD) structures, and the deviation of the 1L1E RD signal away from the prediction of the calculation model have been discussed.

973 program 2006CB604908 2006CB921607 National Natural Science Foundation of China 60625402 The work was supported by the 973 program (Contract Nos. 2006CB604908 and 2006CB921607), and the National Natural Science Foundation of China (Grant No. 60625402).

Identificador

http://ir.semi.ac.cn/handle/172111/7153

http://www.irgrid.ac.cn/handle/1471x/63314

Idioma(s)

英语

Fonte

Tang CG ; Chen YH ; Xu B ; Ye XL ; Wang ZG .Well-width dependence of in-plane optical anisotropy in (001) GaAs/AlGaAs quantum wells induced by in-plane uniaxial strain and interface asymmetry ,JOURNAL OF APPLIED PHYSICS,2009 ,105(10):Art. No. 103108

Palavras-Chave #半导体材料 #aluminium compounds #gallium arsenide #III-V semiconductors #internal stresses #reflectivity #semiconductor heterojunctions #semiconductor quantum wells
Tipo

期刊论文