Surface characteristics of SiO2-TiO2 strip fabricated by laser direct writing


Autoria(s): Li AK; Wang ZM; Liu JJ; Zeng XY; Wang CX; Chen HD
Data(s)

2008

Resumo

SiO2-TiO2 sol-gel films are deposited on SiO2/Si by dip-coating technique. The SiO2-TiO2 strips are fabricated by laser direct writing using all ytterbium fiber laser and followed by chemical etching. Surface structures, morphologies and roughness of the films and strips are characterized. The experimental results demonstrate that the SiO2-TiO2 sol-gel film is loose in Structure and a shrinkage concave groove forms if the film is irradiated by laser beam. The surface roughness of both non-irradiated and laser irradiated areas increases with the chemical etching time. But the roughness of laser irradiated area increases more than that of non-irradiated area under the same etching time. After being etched for 28 s, the surface roughness value of the laser irradiated area increases from 0.3 nm to 3.1 nm.

Hi-Tech Research and Development Program of China 2005AA311030 This work was supported by the Hi-Tech Research and Development Program of China under Grant No. 2005AA311030. The authors would like to thank Dr. X. Jin for his work on characterization of the sol-gel films in experiments.

Identificador

http://ir.semi.ac.cn/handle/172111/7145

http://www.irgrid.ac.cn/handle/1471x/63310

Idioma(s)

英语

Fonte

Li AK ; Wang ZM ; Liu JJ ; Zeng XY ; Wang CX ; Chen HD .Surface characteristics of SiO2-TiO2 strip fabricated by laser direct writing ,CHINESE OPTICS LETTERS,2008 ,6(2):108-111

Palavras-Chave #光电子学 #OPTICAL WAVE-GUIDES #SOL-GEL METHOD #FEMTOSECOND LASER #FILMS #COMPOSITE
Tipo

期刊论文