Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering


Autoria(s): You JB; Zhang XW; Fan YM; Qu S; Chen NF
Data(s)

2007

Resumo

The ZnO films were grown on Ag/Si(001) substrates by sputtering Ag and ZnO targets successively in a pure Ar ambient. A significant enhancement of ZnO ultraviolet emission and a reduction of its full width of half maximum have been observed while introducing a 100 nm Ag interlayer between ZnO film and Si substrate. Furthermore, a complete suppression of the defect related visible emission was also found for the ZnO/Ag/Si sample. This improved optical performance of ZnO is attributed to the resonant coupling between Ag surface plasmon and ultraviolet emission of ZnO. (c) 2007 American Institute of Physics.

Identificador

http://ir.semi.ac.cn/handle/172111/6960

http://www.irgrid.ac.cn/handle/1471x/63218

Idioma(s)

英语

Fonte

You, JB ; Zhang, XW ; Fan, YM ; Qu, S ; Chen, NF .Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering ,APPLIED PHYSICS LETTERS,2007 ,91(23): Art. No. 231907

Palavras-Chave #半导体材料 #MOLECULAR-BEAM EPITAXY
Tipo

期刊论文