Temperature dependence of surface quantum dots grown under frequent growth interruption


Autoria(s): Yu, LK; Xu, B; Wang, ZG; Jin, P; Zhao, C; Lei, W; Sun, J; Hu, LJ
Data(s)

2008

Resumo

We grow In-GaAs quantum dot (QD) at low growth rate with 70 times insertion of growth interruption in MBE system. It is found that because of the extreme growth condition, QDs exhibit a thick wetting layer, large QD height value and special surface morphology which is attributed to the In segregation effect. Temperature dependence of photoluminescence measurement shows that this kind of QDs has a good thermal stability which is explained in terms of a "group coupling" model put forward by us. (C) 2007 Elsevier B.V. All rights reserved.

Identificador

http://ir.semi.ac.cn/handle/172111/6870

http://www.irgrid.ac.cn/handle/1471x/63173

Idioma(s)

英语

Fonte

Yu, LK ; Xu, B ; Wang, ZG ; Jin, P ; Zhao, C ; Lei, W ; Sun, J ; Hu, LJ .Temperature dependence of surface quantum dots grown under frequent growth interruption ,PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES,2008 ,40(3): 503-506

Palavras-Chave #半导体材料 #growth interruption #in segregation #photoluminescence #molecular beam epitaxy #quantum dots
Tipo

期刊论文