Structural properties of ne implanted GaN


Autoria(s): Majid A; Ali A; Zhu JJ; Liu W; Lu GJ; Liu W; Zhang LQ; Liu ZS; Wang H; Zhao DG; Zhang SM; Jiang DS; Wang YT; Yang H; Israr M
Data(s)

2008

Resumo

We report a study on the micro-structural changes in GaN due to neon ion implantation using the x-ray diffraction and Raman scattering techniques. An implantation dose of 10(14) cm(-2) was found unable to produce lattice deformation observable by Raman measurements. For higher doses of implantation several disorder activated Raman scattering centers were observed which corroborate the literature. A new dose dependent feature has been recorded at 1595 cm(-1) for higher implantation doses which is suggested to be the vibrational mode of microcavities produced in the lattice.

Identificador

http://ir.semi.ac.cn/handle/172111/6768

http://www.irgrid.ac.cn/handle/1471x/63122

Idioma(s)

英语

Fonte

Majid A ; Ali A ; Zhu JJ ; Liu W ; Lu GJ ; Liu W ; Zhang LQ ; Liu ZS ; Wang H ; Zhao DG ; Zhang SM ; Jiang DS ; Wang YT ; Yang H ; Israr M .Structural properties of ne implanted GaN ,PHYSICA SCRIPTA,2008 ,77(3): Art. No. 035601

Palavras-Chave #半导体物理 #RAMAN-SCATTERING
Tipo

期刊论文