MOCVD生长掺杂半导体材料的低温退火方法


Autoria(s): 韦欣
Data(s)

19/11/2008

Resumo

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Identificador

http://ir.semi.ac.cn/handle/172111/4243

http://www.irgrid.ac.cn/handle/1471x/61603

Idioma(s)

中文

Fonte

韦欣,MOCVD生长掺杂半导体材料的低温退火方法,CN200710099292.9,20070516

Tipo

专利