一种具有薄氮化铪可协变层的硅基可协变衬底材料
| Data(s) |
02/07/2008
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| Resumo |
Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-06-04T08:36:34Z No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5) Made available in DSpace on 2009-06-04T08:36:35Z (GMT). No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5) Previous issue date: 2008-08 Made available in DSpace on 2009-06-11T08:58:24Z (GMT). No. of bitstreams: 1 full/200610169749.pdf: 1081215 bytes, checksum: 4aa99d5f1d4e9eb4a030aadeda806d78 (MD5) Previous issue date: |
| Identificador | |
| Idioma(s) |
中文 |
| Fonte |
杨少延;范海波;李成明;陈涌海;王占国,一种具有薄氮化铪可协变层的硅基可协变衬底材料 ,200610169749,20061228 |
| Tipo |
专利 |
