分布反馈半导体激光器中光栅的干法刻蚀制作工艺


Autoria(s): 付生辉; 宋国锋; 陈良惠
Data(s)

11/06/2008

Resumo

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Identificador

http://ir.semi.ac.cn/handle/172111/4069

http://www.irgrid.ac.cn/handle/1471x/61516

Idioma(s)

中文

Fonte

付生辉;宋国锋;陈良惠,分布反馈半导体激光器中光栅的干法刻蚀制作工艺 ,200610164885,20061207

Tipo

专利