砷化镓衬底上的多层变形缓冲层的制作方法


Autoria(s): 高宏玲; 曾一平; 段瑞飞; 王宝强; 朱战平; 崔利杰
Data(s)

04/06/2008

Resumo

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Identificador

http://ir.semi.ac.cn/handle/172111/4041

http://www.irgrid.ac.cn/handle/1471x/61502

Idioma(s)

中文

Fonte

高宏玲;曾一平;段瑞飞;王宝强;朱战平;崔利杰,砷化镓衬底上的多层变形缓冲层的制作方法 ,200610144304,20061201

Tipo

专利