一种制作纵向双栅金属-氧化物-半导体器件的方法


Autoria(s): 屠晓光; 陈少武
Data(s)

07/05/2008

Resumo

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Identificador

http://ir.semi.ac.cn/handle/172111/4003

http://www.irgrid.ac.cn/handle/1471x/61483

Idioma(s)

中文

Fonte

屠晓光;陈少武,一种制作纵向双栅金属-氧化物-半导体器件的方法 ,200610114187,20061101

Tipo

专利