利用离子束外延生长设备制备氮化锆薄膜材料的方法


Autoria(s): 杨少延; 柴春林; 刘志凯; 陈涌海; 陈诺夫; 王占国
Data(s)

31/05/2006

Resumo

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Identificador

http://ir.semi.ac.cn/handle/172111/3503

http://www.irgrid.ac.cn/handle/1471x/61233

Idioma(s)

中文

Fonte

杨少延;柴春林;刘志凯;陈涌海;陈诺夫;王占国,利用离子束外延生长设备制备氮化锆薄膜材料的方法,200410009815,20041118

Tipo

专利