半导体薄片材料的横向研磨方法


Autoria(s): 陈弘达; 裴为华
Data(s)

09/08/2006

Resumo

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-06-04T08:36:34Z No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5)

Made available in DSpace on 2009-06-04T08:36:35Z (GMT). No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5) Previous issue date: 2008-08

Made available in DSpace on 2009-06-11T08:57:51Z (GMT). No. of bitstreams: 1 full/200510006190.pdf: 435218 bytes, checksum: fe27cee53195b6feff6f06d75ecbdbca (MD5) Previous issue date:

Identificador

http://ir.semi.ac.cn/handle/172111/3401

http://www.irgrid.ac.cn/handle/1471x/61182

Idioma(s)

中文

Fonte

陈弘达;裴为华,半导体薄片材料的横向研磨方法,200510006190,20050131

Tipo

专利