一种在硅衬底上生长无裂纹Ⅲ族氮化物的方法


Autoria(s): 吴洁君; 韩修训; 李杰民; 黎大兵; 陆沅; 王晓晖
Data(s)

30/08/2006

Resumo

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-06-04T08:36:34Z No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5)

Made available in DSpace on 2009-06-04T08:36:35Z (GMT). No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5) Previous issue date: 2008-08

Made available in DSpace on 2009-06-11T08:57:51Z (GMT). No. of bitstreams: 1 full/200510009509.pdf: 635217 bytes, checksum: 86cb2bac73aa4facf2c801c29274276c (MD5) Previous issue date:

Identificador

http://ir.semi.ac.cn/handle/172111/3387

http://www.irgrid.ac.cn/handle/1471x/61175

Idioma(s)

中文

Fonte

吴洁君;韩修训;李杰民;黎大兵;陆沅;王晓晖,一种在硅衬底上生长无裂纹Ⅲ族氮化物的方法,200510009509,20050222

Tipo

专利